| 1. Identity statement | |
| Reference Type | Journal Article |
| Site | mtc-m16.sid.inpe.br |
| Holder Code | isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S |
| Identifier | 6qtX3pFwXQZGivnJVY/Mc8Tp |
| Repository | sid.inpe.br/mtc-m16@80/2006/08.18.18.11 |
| Last Update | 2006:08.18.18.11.33 (UTC) administrator |
| Metadata Repository | sid.inpe.br/mtc-m16@80/2006/08.18.18.11.34 |
| Metadata Last Update | 2018:06.05.01.17.04 (UTC) administrator |
| Secondary Key | INPE-14065--PRE/9234 |
| ISSN | 1516-1439 |
| Citation Key | SilvaUedOtaReuLep:2006:HyPrTi |
| Title | Hybrid processing of Ti-6Al-4V using plasma immersion ion implantation combined with plasma nitriding  |
| Year | 2006 |
| Month | Jan./Mar. |
| Access Date | 2024, May 19 |
| Secondary Type | PRE PN |
| Number of Files | 1 |
| Size | 339 KiB |
| 2. Context | |
| Author | 1 Silva, Maria Margareth 2 Ueda, Mário 3 Otani, Choyu 4 Reuther, Helfried 5 Lepienski, Carlos Maurício |
| Resume Identifier | 1 2 8JMKD3MGP5W/3C9JHSB |
| Group | 1 2 LAP-INPE-MCT-BR |
| Affiliation | 1 Divisão de Engenharia Mecânica-Aeronáutica 2 Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Plasma (INPE.LAP) 3 Instituto Tecnológico de Aeronáutica, Departamento de Física (ITA) 4 Institute of Ion Beam Physics and Materials Research 5 Universidade Federal do Paraná, Departamento de Física (UFPR) |
| Journal | Materials Research |
| Volume | 9 |
| Number | 1 |
| Pages | 97-100 |
| History (UTC) | 2006-08-18 18:11:34 :: simone -> administrator :: 2018-06-05 01:17:04 :: administrator -> marciana :: 2006 |
| 3. Content and structure | |
| Is the master or a copy? | is the master |
| Content Stage | completed |
| Transferable | 1 |
| Content Type | External Contribution |
| Keywords | Ti6Al4V Plasma Nitriding Plasma Immersion Ion Implantation mechanical properties |
| Abstract | Based on the fact that the Ti-6Al-4V alloy has good mechanical properties, excellent resistance to corrosion and also excellent biocompatibility, however with low wear resistance, this work aims to test plasma processes or combination of plasma and ion implantation processes to improve these characteristics. Two types of processing were used: two steps PIII (Plasma Immersion Ion Implantation) combined with PN (Plasma Nitriding) and single step PIII treatment. According to Auger Electron Spectroscopy (AES) results, the best solution was obtained by PIII for 150 minutes resulting in ~ 65 nm of nitrogen implanted layer, while the sample treated with PIII (75 minutes) and PN (75 minutes) reached ~ 35 nm implanted layer. The improvement of surface properties could also be confirmed by the nanoindentation technique, with values of hardness increasing for both processes. AFM (Atomic Force Microscopy) characterization showed that the single step PIII process presented greater efficiency than the duplex process (PIII + PN), probably due to the sputtering occurring during the second step (PN) removing partially the implanted layer of first step (PIII). |
| Area | FISPLASMA |
| Arrangement | urlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAP > Hybrid processing of... |
| doc Directory Content | access |
| source Directory Content | there are no files |
| agreement Directory Content | there are no files |
| 4. Conditions of access and use | |
| data URL | http://urlib.net/ibi/6qtX3pFwXQZGivnJVY/Mc8Tp |
| zipped data URL | http://urlib.net/zip/6qtX3pFwXQZGivnJVY/Mc8Tp |
| Language | en |
| Target File | Hybrid processing of ti 6ai.pdf |
| User Group | administrator simone |
| Visibility | shown |
| Copy Holder | SID/SCD |
| Archiving Policy | allowpublisher allowfinaldraft |
| Read Permission | allow from all |
| 5. Allied materials | |
| Next Higher Units | 8JMKD3MGPCW/3ET2RFS |
| Citing Item List | sid.inpe.br/mtc-m21/2012/07.13.14.56.06 1 sid.inpe.br/bibdigital/2013/09.25.21.49 1 |
| Dissemination | WEBSCI; PORTALCAPES; COMPENDEX. |
| Host Collection | sid.inpe.br/banon/2003/08.15.17.40 |
| 6. Notes | |
| Empty Fields | alternatejournal archivist callnumber copyright creatorhistory descriptionlevel documentstage doi e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository nextedition notes orcid parameterlist parentrepositories previousedition previouslowerunit progress project readergroup rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype |
| 7. Description control | |
| e-Mail (login) | marciana |
| update | |